CHEMICAL MODIFICATION OF SUBSTRATES BY PHOTO-ABLATION UNDER DIFFERENT LOCAL ATMOSPHERES AND CHEMICAL ENVIRONMENTS FOR THE FABRICATION OF MICROSTRUCTURES

Notice Date

March 7, 2001

Contracting Office

National Institute of Standards & Technology, Acquisition & Assistance Div.,100 Bureau Drive Stop 3572, Bldg. 301, Rm B117, Gaithersburg, MD 20899-3572

ZIP Code

20899-3572

E-Mail Address

NIST Contracts Office (cfoster@nist.gov)

Description

Researches at the National Institute of Standards and Technology (NIST) are working on the following technologies. The disclosed invention consists of a one step photo-ablation process that can simultaneously use different gas or liquid atmospheres to pattern microchannels and functionalize the surface of polymer substrates. For further information, contact the: National Institute of Standards and Technology, Office of Technology Partnerships, 100 Bureau Drive, Stop 2200, Gaithersburg, Maryland 20899; Telecopy: 301-869-2751. This is not a n announcement of a contract action or a grant.

Web Link

NIST Contracts Homepage (http://www.nist.gov/admin/od/contract/contract.htm)

Record

Loren Data Corp. 20010309/SPMSC011.HTM (W-066 SN50F5U3)