Commander, Naval Air Systems Command (Code 2.5.3), Building 441, UNIT 7, Naval Air Station, Patuxent River, MD 20670-1127

A -- ADVANCED LITHOGRAPHY DEVELOPMENT AND PRODUCT/BRASSBOARD DEMONSTRATION SOL N00019-98-BAA-DALP DUE 062698 POC Lisa Abell, Contract Specialist, (301) 757-8943, Vicki Fuhrmann, Contracting Officer, (301) 757-2602 ADVANCED LITHOGRAPHY DEVELOPMENT AND PRODUCT/BRASSBOARD DEMONSTRATION Broad Agency Announcement (BAA) N00019-98-BAA-DALP: Phase I, Proposal Abstracts, due by 26 JUNE 1998; Phase II, Full Proposals, will be requested at a subsequent date, not later than 1 year from the publication date of this notice, based on Congressional approval for the continuation of the Advanced Lithography Program. BAA also listed at WWW.NAVAIR.NAVY.MIL (Business Opportunities/Open Solicitations). Points of Contact (POC): Contract Specialist, Lisa Abell, (301) 757-8943; Contracting Officer, Vicki Fuhrmann, (301) 757-2602; Technical POC, Richard Henson, (301) 342-2637. I. INTRODUCTION. The Naval Air Systems Command (NAVAIR) is announcing this BAA as an unclassified solicitation to obtain science and technology proposals in the areas of Advanced Lithography and Product/Brassboard Demonstration. II. GENERAL INFORMATION. The Navy will continue to work jointly with the Defense Advanced Research Projects Agency (DARPA) pertaining to advanced lithographic technology. Through this BAA competition, NAVAIR expects to make awards within the objectives of the Advanced Lithography Program, which are to push fieldable lithography technology to the 130 nanometer (required) design rule level or 100 nanometer (desired) design rule level and to apply these advanced lithography tools to manufacturing demonstration of products having significant value for military applications. These awards are subject to the availability of appropriations. All awards will be based on merit competition. Consortiums of government, industry, and universities, teaming arrangements and partnership formations which are able to demonstrate fieldable technology are strongly encouraged. Partnership proposals should list one vendor as the principle point of contact and define the relationships among the partners. It is contemplated that industry will cost-share a minimum of 50% of the program in the initial year and a substantially greater portion in any subsequent year. IMPORTANT INFORMATION FOR PROSPECTIVE CONTRACTORS: Registration in the DODs Central Contractor Registration (CCR) database will be a prerequisite for receiving an award resulting from this Broad Agency Announcement. For more information on the CCR, contact the CCR Assistance Center at 1-888-227-2423. III. AREAS OF INTEREST. As a result of past support, the government believes that fieldable technology exists for 180 nanometer design rule lithography using either proximity x-ray or pending 193 nanometer optical lithography. Industry associations have indicated that proximity x-ray lithography is the most developed alternative to optical lithography although other approaches such as extreme ultraviolet, projection electron beam, ion beam and others remain as potential contenders. Accordingly, the objectives of this program are to push fieldable lithography technology to the 130 nanometer (required) design rule level or 100 nanometer (desired) design rule level and to apply these advanced lithography tools to manufacturing demonstration of products having significant value for military applications. Any approach proposed must be able to demonstrate production extendibility to 70 nanometers design rules and below for circuits in silicon. The lithographic portion of this program will be limited to three (3) years for the development; however, the overall program would permit up to another two (2) years to complete the application demonstrations and allow for graceful transition to industry for commercial application. The bulk of the lithography efforts funded would be cross-cutting in that they would be useful to most or all lithography contenders regardless of source wavelength. New, innovative and creative insertion demonstrations of lithography technology may have dual-use but, must have demonstrable potential for significantly enhancing military personnel/systems warfighting capability, reducing the length of lethal conflicts, minimizing collateral damage or fratricide, increasing affordability, increasing intelligence,enhancing the man-machine interface, and/or enhancing the ability of autonomous systems/sensors to replace the need for human operators. Proposed research and insertion approaches should directly benefit the advancement of 130 nanometer and smaller design rule lithography in industry within 3-5 years. Possible areas of investment include: 1.) Proximity X-Ray Technology. The primary focus of the developmental efforts should concentrate on extending mask manufacturing science and technology from 180 nanometers to 130 nanometers, 100 nanometers and eventually 70 nanometer design rule capabilities; providing requirements for a new generation mask patterning, inspection and repair tools as well as new stepper developments; increasing the understanding and control of stress in masks and the patterning of wafers; and furthering any metrology associated with mask manufacturing. 2.) Cross-Cutting/Associated Technologies. Include advanced mask patterning tools; mask inspection tools; SEM mask inspection tools; additive/subtractive mask repair tools; resists; mask materials; stages, steppers and alignment systems; and, metrology equipment; and others. 3.) Product and Brassboard Insertion Demonstrations. Must use advanced non-optical lithography (mix-and-match using optical lithography mixed with alternatives is permitted, where justified) and includes information superiority technology such as extremely high-speed processors and data base storage media for real-time intuitive threat/target identification, battle damage assessment and identification of friendly forces; smart microelectromechanical systems (MEMS) for remote sensing and countermeasures; multispectral, infrared and electro-optical sensors for threat/target identification; advanced low cost photonics for very high speed data communications; high resolution displays for command centers and tactical operators; microwave/millimeter wave devices for sensors/countermeasures applications; and others. IV. CONTRACT/AGREEMENT TYPE. NAVAIR is willing to consider various types of proposals including; traditional FAR/DFARS type contracts and/or non-procurement agreements (e.g., Cooperative Agreements, and "Other Transactions"). Agreements are effected under 10 U.S.C. 2371 (Congressional direction requires that at least 50 percent of the cost of a project under this initiative be provided by industry) and "Section 845, Authority to Carry Out Certain Prototype Projects." Information concerning "Other Transactions" can be found at http://www.darpa.mil/cmo/pages/other_trans.html and http://www.acq.osd.mil/ddre/research, or by contacting Lisa Abell, Contract Specialist, at (301) 757-8943, or by e-mail to Abell_Lisa%PAX8A@mr.nawcad.navy.mil. V. PROPOSAL REQUIREMENTS. Proposals shall be submitted in two (2) phases. Phase I -- Proposal Abstract. Proposers are to submit proposal abstracts, not to exceed 15 pages, in advance of full proposals. Proposal abstracts should contain a technical description of the proposed effort, a summary cost estimate with the anticipated sharing arrangement, an estimated timeframe for project completion, a brief description of the facilities involved, a brief resume of the principle investigator(s), and the contract/agreement type being proposed. The proposal abstract, an original with two (2) additional copies, must be submitted to the following address, or submitted by facsimile to (301) 757-8988, on or before 26 June 1998: Naval Air Systems Command, Code: AIR-2.5.3.3.5, Attn: Lisa Abell -- N00019-98-BAA-DALP, Bldg. 441, Unit 7, 21983 Bundy Road, Naval Air Station, Patuxent River, MD 20670-1127. Contents of Proposal Abstracts may also be submitted electronically to Abell_Lisa%PAX8A@mr.nawcad.navy.mil. Confirmation of receipt is recommended for electronic submission. Proposal abstracts received after this date may not be reviewed. Upon review, the Navy will provide written feedback of the proposal abstract. If a contractor's proposal abstract is selected to continue to Phase II, the date for submission of a full proposal will be provided in writing. REQUEST FOR SUBMISSION OF A FULL PROPOSAL DOES NOT GUARANTEE AWARD SELECTION. Phase II -- Full Proposal. Only Offerors whose Phase I Proposal Abstract is considered capable of meeting DALP Program requirements will be asked to submit Phase II Full Proposals. All proposals submitted under the terms and conditions cited herein will be reviewed. Full proposals should be submitted in two (2) volumes: Volume I, Technical Proposal, and Volume II, Cost/Funding Proposal. Volume II should contain a firm estimate of cost, both total cost and detailed cost for each functional area. The Government expects that respondents will cost share the proposed lithography tool development work (with high quality investments) on an initial 50% basis with an investment growth by 10% per year to 70% by the third year of the program desired. Proposals will be evaluated by the criteria cited in Section VI. Proposals shall be submitted in original, with the signature of an authorizing official, with five copies to the address noted above. Awards are planned by 01 February 1999. TECHNICAL PROPOSAL. Technical proposals should not exceed twenty-five (25) pages and should include the following three sections: Section I -- Executive Summary: Provide a brief technical and business description of the contents of the proposal. The technical area should address the proposal's technical goals, approach, and expected results. The business area should address business and market issues for successful commercialization of the proposal technology. Section 2 -- Technical Issues: Give a detailed explanation of the technical approach, objectives, staffing and resources relating to the development of the proposed technology for both military and commercial use. Discuss clearly and specifically in realistic terms the technical objectives of this proposed effort; include a Statement of Work (SOW) that discusses the specific tasks to be accomplished, tied to the specific approach and goals of the project. Resumes for Principle Investigator(s) and other key research personnel should be submitted, along with a detailed description of the current and planned facilities and equipment to accomplish the research objectives. A description of past performance on similar efforts should be included within Section 2. Section 3 -- Business Issues: Discuss the business issues relating to the commercialization of the proposed development and its impact on the market. Include the benefits to the Department of Defense (DOD). COST/FUNDING PROPOSAL. Cost/funding proposals are not restricted in length, have no specific page layout requirements, and should address funding periods of performance. Work breakdown structures and certified cost or pricing data are neither required nor desired, however, NAVAIR reserves the right the request this information for proposals using FAR/DFARS type contracts. Cost/funding proposals should be organized to include four (4) sections in the following order: total project cost, cost sharing and in-kind contributions, cost to the Government andoff-budget supporting resources. These are described in more detail below. Section 1 -- Total Project Cost: This section will give a detailed breakdown of costs of the project. Cost should also be broken down on a task-by-task basis for each task appearing in the Statement of Work (SOW). This should include all of the proposed costs to the Government and cost sharing by the proposer. The following information should be presented in your proposal for each phase of the effort: total cost of the particular project phase; total proposer cost share; funding requested from the Government; and elements of cost (labor, direct materials, travel, other direct costs, equipment, software, patents, royalties, indirect costs, and cost of money). Sufficient information should be provided in supporting documents to allow the Government to evaluate the reasonableness of these proposed costs, including salaries, overhead, equipment purchases, fair market rental value of leased items, and the method used for making such valuations. Profit should not be included as a cost element if the contract type to be awarded will be cost sharing. Section 2 -- Cost Sharing and In-Kind Contributions: This section will include: (1) the sources of cash and amounts to be used for matching requirements; (2) the specific in-kind contributions proposed, their value in monetary terms, and the methods by which their values were derived; and (3) evidence of the existence of adequate cash or commitments to provide sufficient cash in the future. Affirmative, signed statements are required from outside sources of cash. Proposals should contain sufficient information regarding the sources of the proposer's cost share so that a determination may be made by the Government regarding the availability, timeliness, and control of these resources. For example: How will the funds and resources be applied to advance the progress of the proposed effort? What is the role of any proposed in-kind contributions? Section 3 -- Cost to the Government: This section will specify the total costs proposed to be borne by the Government and any technical or other assistance including equipment, facilities, and personnel of Federal laboratories, if any, required to support these activities. The cost to the Government should be that portion of the proposed effort, which is not covered by the contractor's portion of the cost share. The costs incurred and work performed by any DOD or national laboratory "partnering" with the offeror under the proposal shall normally be considered costs of the Government and not costs of the proposer for purposes of the cost-sharing requirement. Proposals should contain sufficient information regarding the resources to be provided by the Government so that an evaluation of their availability, timeliness, and control may be made. Section 4 -- Off-Budget Supporting Resources: This section will show cash or in-kind resources which will support the proposed activity but which are not intended to be included in the total project cost. Items in thiscategory do not count as cost share nor as Federal funds which must be matched. Examples of items to place in this category include: Commitments of cash or in-kind resources from other Federal sources, such as national laboratories, and projections of fee-based income where there is substantial uncertainty about the level which will actually be collected and where the income is not needed to meet cost-share requirements. VI. EVALUATION CRITERIA. The primary evaluation criteria, of equal weight, are: (1) Scientific and technical merits of the proposed research to include, (a) the degree to which proposed research and development objectives support the targeted technical topic and (b) validity of the technical basis for the approach offered; and (2) Relevance and potential contributions of the research to the objectives of the Advanced Lithography Program. Other evaluation criteria, of lesser importance than (1) and (2) but equal to each other, are: (3) The qualifications of the task principal investigator andother key research personnel; (4) The adequacy of current or planned facilities and equipment to accomplish the research objectives; and (5) The realism and reasonableness of cost, including proposed cost sharing. (6) Past performance on similar efforts. Final decision on award type will be made by the Government. (0152)

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