SPECIAL NOTICE
34 -- NOTICE OF INTENT TO SOLE SOURCE: Plasma-Therm LLC HBr-Cl-based ICP Silicon Etch System and DRIE-based ICP Silicon Etch System
- Notice Date
- 1/31/2023 7:15:59 AM
- Notice Type
- Special Notice
- NAICS
- 333242
— Semiconductor Machinery Manufacturing
- Contracting Office
- DEPT OF COMMERCE NIST GAITHERSBURG MD 20899 USA
- ZIP Code
- 20899
- Solicitation Number
- NB680000-23-00677
- Response Due
- 2/15/2023 7:00:00 AM
- Point of Contact
- Ian Robinson, Angela Hitt
- E-Mail Address
-
ian.robinson@nist.gov, angela.hitt@nist.gov
(ian.robinson@nist.gov, angela.hitt@nist.gov)
- Description
- The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate, on a sole source basis, with PlasmaTherm, LLC of 10050 16th ST N, Saint Petersburg, FL 33716-4219 for the purchase of the following systems. The statutory authority for this acquisition is 41 USC 3304(a)(1), as implemented under the authority of 41 U.S.C. 1901.� 1 QTY, PlasmaTherm HBr-Cl-based ICP Silicon Etch System. 5 year warranty (one-year base + 1 four-year option) 1 QTY, PlasmaTherm HBr-Cl-based ICP Silicon Etch System. 5 year warranty (one-year base + 1 four-year option) Based on the Government�s market research, only Plasma-Therm can provide a commercially available product that meets the following combined minimum specifications: Substrate electrode temperature shall be variable from minus 20 degrees Celsius to plus 100 degrees Celsius or broader. �The sample loading system shall have the ability to transfer a metal carrier plate with the sample and a propriate clamp with backside helium cooling into the process chamber. The NanoFab User Facility user base is currently trained in the operation of the Plasma-Therm ICP etching system. The user interface, software, hardware design, gas flow system, and vacuum system, will be similar on Plasma-Therm�s new Corial 210IL ICP etching system, so users will have an almost seamless transition between using the two etch systems. Changing the etch system would require retraining staff and every user, to include requiring the re-qualification of each process used by each user which would severely impair timely research progress. Plasma-Therm, LLC is the sole manufacturer and distributor of the commercial equipment that meets the required minimum specifications.�� The North American Industry Classification System (NAICS) code for this acquisition is 333242 � Semiconductor Machinery Manufacturing, with a small business size standard of 1,000 employees.�� A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government.� Information received will be considered solely for the purpose of determining whether to conduct a competitive procurement.��� No solicitation package will be issued.� This notice of intent is not a request for quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. Interested parties that believe they can satisfy the requirements listed above must identify their capability in writing before the response date of this notice. Only responses received by 10:00 a.m. Eastern Standard Time on February 15, 2023 will be considered by the government.� Responses shall be submitted via email to ian.robinson@nist.gov and angela.hitt@nist.gov. Contracting Office Address:� 100 Bureau Drive� Bldg. 301, Mail Stop 1640� Gaithersburg, Maryland 20899-0001�
- Web Link
-
SAM.gov Permalink
(https://sam.gov/opp/cfb83b9ab25e42f9a5a0b7a0f2ae1d83/view)
- Place of Performance
- Address: Gaithersburg, MD 20899, USA
- Zip Code: 20899
- Country: USA
- Zip Code: 20899
- Record
- SN06577603-F 20230202/230131230106 (samdaily.us)
- Source
-
SAM.gov Link to This Notice
(may not be valid after Archive Date)
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