SPECIAL NOTICE
R -- Notice of Intent to Sole Source: Oxford Instruments America, Inc., for the procurement of a Tetraethyl orthosilicate (TEOS) upgrade of an existing dual frequency, parallel plate, Oxford Instruments PECVD system
- Notice Date
- 2/11/2020 3:51:09 AM
- Notice Type
- Special Notice
- NAICS
- 811219
— Other Electronic and Precision Equipment Repair and Maintenance
- Contracting Office
- DEPT OF COMMERCE NIST GAITHERSBURG MD 20899 USA
- ZIP Code
- 20899
- Solicitation Number
- NB680010-20-00968
- Response Due
- 2/25/2020 9:00:00 AM
- Archive Date
- 03/11/2020
- Point of Contact
- Joni L. Laster, Phone: 3019756205, Forest Crumpler, Phone: 3019756753
- E-Mail Address
-
joni.laster@nist.gov, forest.crumpler@nist.gov
(joni.laster@nist.gov, forest.crumpler@nist.gov)
- Description
- The United States Department of Commerce (DOC), National Institute of Standards and Technology (NIST), Acquisition Management Division (AMD) intends to negotiate a firm fixed price purchase order, on a sole source basis, with Oxford Instruments America, Inc., for the procurement of a Tetraethyl orthosilicate (TEOS) upgrade of an existing dual frequency, parallel plate, Oxford Instruments Plasma Enhanced Chemical Vapor Deposition (PECVD) system. ����The statutory authority for this sole source acquisition is FAR 13.106-1(b) by the authority of FAR Part 13 Simplified Acquisition Procedures. The National Institute of Standards and Technology (NIST) Center for Nanoscale Science and Technology (CNST) enables science and industry by providing essential measurement methods, instrumentation, and standards to support all phases of nanotechnology development, from discovery to production.� The added capability of depositing high quality PECVD TEOS will allow users to employ TEOS based: sacrificial layers in microelectromechanical systems; cladding layers in nanophotonic and optomechanical structures; metamaterial stack layers, and dielectric layers in electronics applications. The users will develop methods of depositing TEOS with tailored material (stress/stoichiometry/refractive index) properties in the CNST NanoFab as a resource accessible to NIST and external researchers. The Oxford Instruments PlasmaLab 100 PECVD is a dual frequency, parallel plate, system that allows customization of the deposit film optical and mechanical properties.� The addition of TEOS to the dual frequency PECVD system will allow for tailoring of the stress and stoichiometry of the deposited TEOS films, thereby allowing for the optimization of optical film losses. The upgrades shall require proprietary hardware and software changes.� TEOS is a liquid source that must be kept heated to provide the vapor required for processing.� The source, heating, dispensing requires modifications to the existing gas delivery systems and must be integrated into the software to enable system monitoring to prevent unsafe conditions both for the tool and the users.� The design of the hardware that will safely deliver vapor to the process chamber and remove it through the vacuum system is proprietary.� In addition, the integration of the hardware into the system control software is also proprietary.� The necessary components and integration expertise are proprietary, and Oxford Instruments does not make the parts or procedures needed to complete the upgrades available to any other vendor.� Therefore, Oxford Instruments is uniquely qualified to prove the necessary services, parts and technical personnel, required for this upgrade. As the original equipment manufacturer (OEM), Oxford Instruments, has the responsibility of maintaining these unique systems.� The vendor maintains parts and service engineering availability.� Delivery shall be FOB DESTINATION and shall be in accordance with the Contractors established service lead times.���� The North American Industry Classification System (NAICS) code for this acquisition is 811219, and the size standard is 20.5M. No solicitation package will be issued.� This notice of intent is not a request for competitive quotations; however, all responsible sources interested may identify their interest and capability to respond to this requirement. The Government will consider responses received by established due date/time set forth in this notice. Inquiries will only be accepted via email to joni.laster@nist.gov . No telephone requests will be honored.��� A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will normally be considered solely for determining whether to conduct a competitive procurement in the future.�
- Web Link
-
SAM.gov Permalink
(https://beta.sam.gov/opp/8827728a6e6645af8c3e8a9410f5550f/view)
- Place of Performance
- Address: Gaithersburg, MD 20899, USA
- Zip Code: 20899
- Country: USA
- Zip Code: 20899
- Record
- SN05557380-F 20200213/200211230149 (samdaily.us)
- Source
-
SAM.gov Link to This Notice
(may not be valid after Archive Date)
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