SOURCES SOUGHT
66 -- Electron Beam Lithography (EBL) System Attachment for a JEOL 7800F FESEM
- Notice Date
- 1/5/2018
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B130, Gaithersburg, Maryland, 20899-1410, United States
- ZIP Code
- 20899-1410
- Solicitation Number
- AMD-SS18-05
- Archive Date
- 2/3/2018
- Point of Contact
- Forest Crumpler, Phone: 3019756753
- E-Mail Address
-
forest.crumpler@nist.gov
(forest.crumpler@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- The National Institute of Standards & Technology (NIST) intends to procure an Electron Beam Lithography (EBL) System Attachment for a JEOL 7800F FESEM to support nanofabrication research and development in the Center for Nanoscale Science and Technology (CNST) user facility. The system will be sited and used as a shared resource in the CNST NanoFab, accessible to researchers from industry, academia, NIST, and other government agencies. After results of this market research are obtained and analyzed, and specifications developed, NIST may conduct a competitive procurement and subsequently award a Purchase Order for an EBL system attachment for a JEOL 7800F FESEM. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside. The EBL system attachment mounted on a SEM is a unique and essential capability for the NanoFab. It provides the ability to place nanoscale lithographic patterns on specific areas of a sample, such as writing a lithography pattern on a small piece of graphene. The NanoFab currently owns and operates a Zeiss NVision 40 Cross Beam microscope with a Raith ELPHY Quantum EBL attachment that is 10+ years old for this purpose. NIST intends to retire this system and replace it with a new EBL attachment which will be mounted on an existing JEOL 7800F FESEM. NIST has a need for a new electron beam lithography system attachment for a JEOL 7800F FESEM that would meet the following: 1.BASIC HARDWARE REQUIREMENTS: •Pattern generating hardware with a minimum of 12 MHz pattern writing speed •A minimum of 16-bit DACs for mainfield electron beam control •Direct connection and interface with a JEOL 7800F FE-SEM with all connecting cables and/or adapters included. 2.SOFTWARE: •Operating software with built-in multi-user control allowing separate log-in and use of system •Built-in CAD design software allowing import of data formats such as GDS-2, CIF, and DXF. •Built-in proximity effect correction software allowing optimum pattern dose distribution. 3.No prototypes, demonstration models, used or refurbished instruments will be considered. 4.COMPUTER: To be supplied with system with Windows 7 or newer operating system. 5.MANUALS: All manuals necessary to operate and maintain the system shall be included in both printed and electronic form. 6.DELIVERY and INSTALLATION: The delivery and installation of the system in the CNST NanoFab class 100 cleanroom shall be completed in less than 6 months ARO. 7.TRAINING: One onsite training session for a group of process engineers required after system installation 8.SERVICE SUPPORT: Software, application and hardware phone support for the life of the instrument. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 333314, as those domestic sources having 500 employees or less. Please include your company's size classification and socio-economic status in any response to this notice. Companies that manufacture an electron beam lithography system attachments for JEOL FESEMs are requested to email a detailed response describing their abilities to patrick.staines@nist.gov no later than the response date for this sources sought notice. The response should include achievable specifications and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice: 1. Name of the company that manufactures the system for which specifications are provided. 2. Name of company(ies) that are authorized to sell the system, their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indication of number of days, after receipt of order that is typical for delivery of such a system. 4. Indication of whether each instrument for which specifications are sent to patrick.staines@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s). 5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-SS18-05/listing.html)
- Place of Performance
- Address: 100 Bureau Drive, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN04782254-W 20180107/180105230642-1837e0ef36e50138feb6977fafd818d3 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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