SPECIAL NOTICE
66 -- Notice of Intent to Purchase an In Situ Spectroscopic Ellipsometer - Attachment
- Notice Date
- 6/8/2017
- Notice Type
- Special Notice
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B130, Gaithersburg, Maryland, 20899-1410, United States
- ZIP Code
- 20899-1410
- Solicitation Number
- SB1341-17-RQ-0543
- Archive Date
- 7/3/2017
- Point of Contact
- Heather Bauer, Phone: 3019752752
- E-Mail Address
-
heather.bauer@nist.gov
(heather.bauer@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- Statement of Work FBO ANNOUNCEMENT: PRESOLICITATION NOTICE, NOTICE OF INTENT ACTION CODE: SPECIAL NOTICE CLASSIFICATION CODE: 66- Instruments and Laboratory Equipment SUBJECT: Purchase of In Situ Spectroscopic Ellipsometer SOLICITATION NUMBER: SB1341-17-RQ-0543 RESPONSE DATE: 10 days after posting DESCRIPTION: The National Institute of Standards and Technology (NIST) intends to negotiate on a sole source basis, under the authority of FAR 13.106-1(b) (1), with J. A. Woollam Co. Inc., located at 645 M St STE 102, Lincoln, NE 68508-2285 to purchase an In Situ Spectroscopic Ellipsometer. The sole source justification is based on the following: The Chemical Sciences Division (CSD), part of The National Institute for Standards and Technology's (NIST's) Material Measurement Laboratory (MML), serves as the Nation's reference laboratory for chemical measurements and standards to enhance U.S. industry's productivity and competitiveness, assure equity in trade, and provide quality assurance for chemical measurements used for assessing and improving public health, safety, and the environment. The CSD is responsible for providing the measurement science, standards, technology, data and chemical informatics required to support the nation's needs in the determination of chemical composition and chemical structure of gases, organic, and inorganic species and in the measurement of a wide variety of chemical properties and processes, including chemical reactivity and mechanisms, and thermochemical properties. In support of this mission, the Chemical Process and Nuclear Measurements Group, within the CSD, constructs and maintains a variety of ultra-high purity atomic layer deposition (ALD) and chemical vapor deposition (CVD) systems for depositing thin films of oxides, nitrides, and chalcogenides. The requested in situ spectroscopic ellipsometer system will examine oxide, nitride, and chalcogenide thin film deposition processes in real time. The requested instrument will facilitate the identification of critical process parameters and their correlation with other thin film measurements. The J. A. Woollam Co. Inc. equipment is compatible and adaptable with respect to the hardware, proprietary data acquisition software, and method of modeling and data analysis of eight (8) existing J. A. Woollam Co. Inc. M-2000 model ellipsometers installed at NIST (CNST, PML, MML). Data acquisition and experimental data for existing systems at NIST are in a proprietary format and can be processed across all existing systems. NIST already possesses several software licenses from J.A. Woollam Co. for data acquisition and modeling that will be used to analyze the proprietary format experimental data obtained from the in situ spectroscopic ellipsometry system. NIST staff already have training on using J. A. Woollam Co. Inc. hardware and software. All the systems can use the same calibration artifacts for comparison and performance evaluations. Vacuum chamber mounting hardware for in situ measurements can be interchangeable with existing systems to perform specialized measurement without needing to design custom chamber mounts. Regular maintenance across platforms will be performed using the same procedures. The system requirements consist of the following: 1.ATTACHMENT TO VACUUM CHAMBER: System should be designed and built for mounting onto a vacuum chamber for in situ data acquisition. Mounts for attachment to vacuum chamber should be designed to accommodate 1-1/3" or 2-3/4" CF flanges. 2.WAVELENGTH: Instrument should be spectroscopic and include the wavelength range from 250 nm to 1000 nm. The system should capture a minimum of 450 wavelengths in the spectrum. All wavelengths should be acquired concurrently. 3.BEAM ALIGNMENT: The polarizer arm should be equipped with a kinematic stage for tilt adjustment to facilitate alignment of the beam on the substrate. The analyzer arm should be equipped with a kinematic stage for tilt and translation adjustment for alignment of the reflected beam on the detector. The analyzer unit should be equipped with a 4-quandrant detector to facilitate accurate beam alignment when moving the ellipsometer between different vacuum chambers and different external bases. 4.MEASUREMENT: Capable of determining Psi data from 0° to 90°. Capable of determining Delta data from 0° to 360°. Measurement precision of 0.003 nm (1 standard deviation) of a 2 nm SiO2 layer on a silicon substrate. 5.DATA ACQUISITION SPEED: Spectral acquisition rate should be ≤0.066 s (15 Hz) for the entire wavelength range. 6.OPTICAL DESIGN: Instrument should be of a continuously rotating compensator ellipsometer (RCE) type. 7.OPTICAL WINDOWS: System should include a pair of fused silica view ports for installation on 1-1/3" or 2-3/4" CF flanges. 8.TEST BASE: System should include a basic test stage for ex situ testing and calibration. 9.COMPUTER AND SOFTWARE: The instrument must be computer controlled and the necessary computer and software should be included with the system. System operating software shall facilitate ease of instrument use for multi-users. The following software requirements should also be met: 9.a.Software should provide both data acquisition and analysis. 9.b.Software should include calibrations, data acquisition of psi, delta, and % depolarization. 9.c.Software should provide automated programs for the extraction of optical constants n and k, and film thickness, both for isotropic and anisotropic thin films. 9.d.Software should allow for real-time measurement, analysis, and display of acquired data, including Mueller Matrix analysis. 9.e.Software should include facilities for multi-sample analysis (concurrent fitting of unknown parameters across a self-consistent dataset), sensitivity/uniqueness analysis (error-minimization analysis on a parametric basis), automated initial value guessing, and corrections for window effects to mitigate errors from strain on vacuum chamber view ports. 9.f.Software should include a large n and k database including widely used materials in the semiconductor industry. 9.g.Software should include a large database of parametric models. 9.h.Five or more software site licenses should be offered. 9.i.Contractor must provide on-site installation of the ellipsometer system. 9.j.Contractor must provide on-site training of software and system operation. 10.DATA COMPATIBILITY: Data files and analytical models generated by the system should be cross-compatible with existing ellipsometers at NIST to facilitate exchange of spectroscopic data and models among systems with complementary measurement capabilities. This includes the in situ collection of spectroscopic ellipsometry data from a surface, the subsequent collection of ex situ spectroscopic ellipsometry data from the same surface using a separate instrument covering additional wavelength ranges and angle, the subsequent refinement of the optical model using the ex situ data set, and the subsequent re-analysis of the in situ data based on the refined and fully-constrained model. 11.EXTERNAL COMMUNICATION: System should include an external communication interface for communication between the ellipsometer and auxiliary customer-owned computer systems used to control ALD and CVD reactor hardware. The following communications requirements should also be met: 11.a.System should include a dedicated hardware interface for measurement triggering by TTL and relay logic 11.b.System should include two-way communication over a TCP/IP link 11.c.System should include two-way communication that allows for the triggering of one-time and continuous data acquisition 11.d.System should include two-way communication that allows for the starting, pausing, resuming, and stopping of data acquisition, including endpoint detection 11.e.System should include two-way communication that allows for querying the state of the ellipsometer 11.f.System should include two-way communication that allows for polling of results (such as layer thickness values) from a model fit to the acquired data on a synchronous and asynchronous basis 12.UPGRADEABLE DESIGN: System should be modular and upgradeable at a future date with respect to the wavelength ranges accessed by the light source and the detector assemblies. 13.CALIBRATION WAFERS: SiO2 on Si calibration wafer(s) 50 mm in diameter should be included with system. 14.INSTALLATION: The system should be installed by the Contractor at NIST. The installation, at a minimum, shall include uncrating, set-up of system, demonstration that it meets or exceeds specifications, basic maintenance, calibration, and troubleshooting procedures. 15.TRAINING: The Contractor shall conduct one training session for up to 3 users at NIST immediately following installation. Training should provide thorough demonstration on how to operate the system and analyze data. Market research has shown that J. A. Woollam Co. Inc. is the sole company who can provide this equipment to NIST. Given these facts, J. A. Woollam Co. Inc. is the only source reasonably available to provide the required equipment and software. The resulting purchase order will be a Firm Fixed Price purchase order. The NAICS Code is 334516 with a size standard of 1,000 employees. No solicitation package will be issued. This notice of intent is not a request for competitive quotations; however, interested parties who regard themselves as capable of fulfilling these requirements are invited to submit responses to the Government for consideration. Responses received by 11:59 pm EST 06/18/2017, will be considered by the Government. A determination by the Government not to compete the proposed acquisition based upon responses to this notice is solely within the discretion of the Government. Information received will normally be considered solely for the purpose of determining whether to conduct a competitive procurement. Inquiry POCs: heather.bauer@nist.gov Primary Wendy.Paulo@nist.gov Secondary National Institutes of Standards and Technologies NIST Acquisition Management Division (AMD) 100 Bureau Dr. Mail Stop 1640 Gaithersburg, MD. 20899-1640
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