MODIFICATION
66 -- SPUTTER COATER
- Notice Date
- 8/22/2016
- Notice Type
- Modification/Amendment
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B130, Gaithersburg, Maryland, 20899-1410, United States
- ZIP Code
- 20899-1410
- Solicitation Number
- SB1341-16-RQ-0780
- Archive Date
- 9/13/2016
- Point of Contact
- Ranae M. Armstrong, Phone: 3019758088, Lynda M Roark, Phone: 3019753725
- E-Mail Address
-
ranae.armstrong@nist.gov, Lynda.Roark@nist.gov
(ranae.armstrong@nist.gov, Lynda.Roark@nist.gov)
- Small Business Set-Aside
- Total Small Business
- Description
- The purpose of amendment 0002 is to extend the NLT response date FROM: August 19, 2016 TO: August 29, 2016, 12:00pm EST; AND to provide the following questions and responses: Q1. Specify the substrate shape and size requirement that will be used for acceptance or system usage R1. This is not being used to coat wafers. Chamber size is specified in specification number 1 "Shall have a minimum work chamber size of 125 mm diameter by 100 mm height" Q2. What is the required sputter target size/gun size? R2. Disk style: minimum of 55 mm diameter and 0.1 mm thickness Q3. Is there a requirement for the type of sputter gun required, DC or RF? R3. No Q4. Are gases other than Argon gas required to be processed? R4. Capability for Argon process gas and Nitrogen venting gas is required Q5. Is a heater for the substrate required? R5. No Q6. Is there a vacuum requirement such as minimum base pressure etc..? R6. A clean (oil free) vacuum pumping system capable of pumping down to at least 10^-4 Torr, is required, as indicated in Amendment 0001 Q7. Does "rotational tilting" mean primary/polar rotation and azimuthal rotation (i.e the center of the substrate is fixed during rotation); OR the rotation and tilting will be used independent of each other where the center of the substrate is not fixed. R7. Where the sample is rotated about the vertical and can also be tilted independently from horizontal. Q8. Clarify the number of sputter guns required in the chamber. The solicitation stated a dual sputter technique. If two sputter guns are required, will users share one DC or RF (specify whether DC or RF is required) supply or need two independent power supply. R8. Two sputter guns are required for sequential sputtering. Therefore, both can share the same power source. There is not a requirement for DC or RF Q9. Specify gold target and chromium target diameter and thickness listed in specification number 9. R9. Minimum of 55 mm diameter and 0.1 mm thickness All other terms and conditions remain unchanged
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/SB1341-16-RQ-0780/listing.html)
- Place of Performance
- Address: 100 Bureau Drive, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN04235550-W 20160824/160822235949-ab256a230a4a73621b6ed61955929800 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
| FSG Index | This Issue's Index | Today's FBO Daily Index Page |