SOURCES SOUGHT
66 -- Electron Beam Lithography System
- Notice Date
- 11/28/2012
- Notice Type
- Sources Sought
- NAICS
- 333314
— Optical Instrument and Lens Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640, United States
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-13-SS08
- Archive Date
- 12/28/2012
- Point of Contact
- Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
todd.hill@nist.gov
(todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- The National Institute of Standards and Technology (NIST) seeks information on commercial vendors that are capable of providing a stand-alone, direct-write electron beam lithography system to support nanofabrication research and development in the Center for Nanoscale Science and Technology (CNST) user facility. The system will be sited in a class 100 cleanroom and used as a shared resource accessible to researchers from industry, academia, NIST, and other government agencies, ranging from nanolithography novices to experts in the field. After results of this market research are obtained and analyzed, and specifications developed, NIST may conduct a competitive procurement and subsequently award a Purchase Order for a stand-alone, direct-write electron beam lithography system. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside. NIST currently owns and operates multiple electron beam lithography systems in the CNST NanoFab that are heavily used for a wide range of projects, with the most in-demand system being a JEOL JBX-6300-FS. In order to increase NIST's capacity to serve users and provide continuous service during scheduled or unscheduled maintenance of the JEOL system, while minimizing the cost of retraining users, NIST has a need for a new stand-alone, direct write electron beam lithography system that would meet the following requirements: 1. RESOLUTION: The system shall be capable of fabricating a single write line of width 10 nm or less using a commercial electron beam lithography resist. 2. ACCELERATING VOLTAGE: The electron-optical system shall operate with an accelerating voltage of 100 kV or higher. 3. SCANNING SPEED: The system shall operate with a beam scanning speed of at least 50 MHz with position deflectors that are digitally controlled. 4. SUBSTRATE CAPABILITY: The system shall handle substrates from small piece parts up to and including circular wafers of at least 200 mm in diameter. 5. SAMPLE HOLDER: The system shall be supplied with 50 mm, 75 mm, 100 mm, 150 mm, and 200 mm sample holders. These substrate handling cassettes shall be fully compatible with NIST's existing JEOL JBX-6300 and enable cassettes and samples to be transferred seamlessly between the two systems. 6. SAMPLE LOADING: The system shall include a separate, load-locked vacuum chamber, evacuated by a turbomolecular pump, for automated loading and unloading of samples into the instrument, with a capacity of at least 10 individual sample holders. 7. MECHANICAL STAGE: The system shall include a stage positioning system capable of less than1 nm placement precision, with stage travel of at least 150 mm in both x- and y-directions. 8. CURVED SURFACE WRITING: The system shall be capable of automatically adjusting and exposing non-planar surfaces with height variations of at least1 mm across the substrate. This component shall be fully integrated with the instrument and allow backward compatibility for use with NIST's current JEOL JBX 6300. 9. SOFTWARE: Existing users of CNST's JEOL JBX 6300 shall be able to operate the system with little or no retraining, and new users trained on one system shall be able to operate the other with little or no additional training. The operating control of the system shall be fully compatible and similar in job definition and pattern formatting to the JEOL JBX 6300, using compiled magazine files (.mgn) to run exposures. 10. MANUALS: All manuals necessary to operate and maintain the system shall be included in both printed and electronic form. 11. REQUEST FOR PROPOSALS AND AWARD: NIST anticipates issuing a Request for Proposals for the system no later than the second quarter of fiscal year 2013 (first quarter of calendar year 2013), and awarding a Purchase Order for the system no later than the fourth quarter of fiscal year 2013 (third quarter of calendar year 2013). 12. DELIVERY and INSTALLATION: The delivery and installation of the system in the CNST NanoFab class 100 cleanroom shall be completed in less than 12 months ARO. 13. TRADE-IN AND REMOVAL OF EXISTING SYSTEM: The purchase order shall include trade-in of an existing Vistec VB300 E-beam lithography system, including de-installation and removal of the Vistec system from the CNST NanoFab class 100 cleanroom. 14. SERVICE SUPPORT: An aftermarket support option shall be available that includes a 24 hour response time (within the next business day) with a qualified field service engineer on site at NIST within this time period. 15. PAST PERFORMANCE: All systems proposed shall have a documented history of multiple instrument installations in research-based user facilities located within the United States, and the vendor shall provide references from these facilities in the response to this notice. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 333314, as those domestic sources having 500 employees or less. Please include your company's size classification and socio-economic status in any response to this notice. Companies that manufacture a direct write electron beam lithography system are requested to email a detailed response describing their abilities, and addressing the requirements set forth herein, to todd.hill@nist.gov no later than the response date for this sources sought notice. The response should include achievable specifications and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice: 1. Name of the company that manufactures the system for which specifications are provided. 2. Name of company(ies) that are authorized to sell the system, their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indication of number of days, after receipt of order that is typical for delivery of such a system. 4. Indication of whether each instrument for which specifications are sent to todd.hill@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s). 5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-13-SS08/listing.html)
- Place of Performance
- Address: NIST, Gaithersburg, Maryland, 20899, United States
- Zip Code: 20899
- Zip Code: 20899
- Record
- SN02938794-W 20121130/121128234901-6e1affc126513af04a2c034193cb2598 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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