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FBO DAILY ISSUE OF NOVEMBER 04, 2012 FBO #3998
SOURCES SOUGHT

66 -- Deep Silicon Reactive Ion Etch System - AMD-13-SS04 document

Notice Date
11/2/2012
 
Notice Type
Sources Sought
 
NAICS
334516 — Analytical Laboratory Instrument Manufacturing
 
Contracting Office
Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640, United States
 
ZIP Code
20899-1640
 
Solicitation Number
AMD-13-SS04
 
Archive Date
12/1/2012
 
Point of Contact
Paula Wilkison, Phone: 301-975-8448, Todd D Hill, Phone: 301-975-8802
 
E-Mail Address
paula.wilkison@nist.gov, todd.hill@nist.gov
(paula.wilkison@nist.gov, todd.hill@nist.gov)
 
Small Business Set-Aside
N/A
 
Description
NIST Sources Sought Notice for a Deep Silicon Reactive Ion Etch System The National Institute of Standards & Technology (NIST) seeks information on commercial vendors that are capable of providing a Deep Silicon Reactive Ion Etch System. Companies capable of providing a Deep Silicon Reactive Ion Etch System are requested to email a detailed report describing their capabilities to paula.wilkison@nist.gov no later than the response date for this sources sought notice. Please see attachment for details and instructions.
 
Web Link
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-13-SS04/listing.html)
 
Record
SN02923639-W 20121104/121102233950-d71689e3d1e0896ccef5376c4902a917 (fbodaily.com)
 
Source
FedBizOpps Link to This Notice
(may not be valid after Archive Date)

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