SOURCES SOUGHT
66 -- Deep Silicon Reactive Ion Etch System - AMD-13-SS04 document
- Notice Date
- 11/2/2012
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640, United States
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-13-SS04
- Archive Date
- 12/1/2012
- Point of Contact
- Paula Wilkison, Phone: 301-975-8448, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
paula.wilkison@nist.gov, todd.hill@nist.gov
(paula.wilkison@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- NIST Sources Sought Notice for a Deep Silicon Reactive Ion Etch System The National Institute of Standards & Technology (NIST) seeks information on commercial vendors that are capable of providing a Deep Silicon Reactive Ion Etch System. Companies capable of providing a Deep Silicon Reactive Ion Etch System are requested to email a detailed report describing their capabilities to paula.wilkison@nist.gov no later than the response date for this sources sought notice. Please see attachment for details and instructions.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-13-SS04/listing.html)
- Record
- SN02923639-W 20121104/121102233950-d71689e3d1e0896ccef5376c4902a917 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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