MODIFICATION
66 -- Multi Target Sputtering System
- Notice Date
- 9/14/2012
- Notice Type
- Modification/Amendment
- NAICS
- 333295
— Semiconductor Machinery Manufacturing
- Contracting Office
- ACC-APG - Adelphi, ATTN: AMSRD-ACC, 2800 Powder Mill Road, Adelphi, MD 20783-1197
- ZIP Code
- 20783-1197
- Solicitation Number
- W911QX12R0032
- Response Due
- 9/17/2012
- Archive Date
- 11/16/2012
- Point of Contact
- Daniel Dougherty, 301-394-4680
- E-Mail Address
-
ACC-APG - Adelphi
(daniel.p.dougherty14.civ@mail.mil)
- Small Business Set-Aside
- Total Small Business
- Description
- This is a combined synopsis/solicitation for commercial items prepared in accordance with the format in Subpart 12.6, as supplemented with additional information included in this notice. This announcement constitutes the only solicitation; proposals are being requested and a written solicitation will not be issued. See attachment for the Amended Combo Synopsis/Solicitation Items updated are as follows: 1. Delivery of the system is now Six (6) Months after contract award Below are received questions and subsequent answers to the solicitation. If there are any further questions that are not addressed below they must be received by COB 13 September 2012. 1. Will refurbished equipment be considered if it is able to meet all of your requirements, including the one year warranty, etc.? Answer: New, unused equipment is being solicitated 2. Does the water cooled front access door need to be a door? What about removable top lid? Answer: A removable lid would be adequate. Water cooling is expected to be necessary as long deposition times at elevated temperature are planned. 3. Are Tilt mounts on the Flex Mount Assemblies to be manually adjusted with chamber open? Or does the customer want something to adjust tilt from outside of chamber? Answer: Manual tilt adjustments with chamber open are accessible. Other capabilities such as automated or in-situ adjustments would be seen as an added benefit. 4. Does the user expect that each source can run RF, DC or pulsed DC via some switch ? Or swapping cables? Or does he mean that one source should run RF, one source should run DC, and one soruce should run pulsed DC? Answer: Any single source should have the capability of being configured to operate via RF, DC, or Pulsed DC operation. Further, both dual and triple source operation is desired such that any combination of RF, DC, or Pulsed DC operation could be completed any of the 2 or 3 sources. 5. What gasses are to be introducing directly to substrate? Answer: Common gases would include Ar, N2, and O2 6. Customer mentions Cryo pump here and turbo pump. I assume since you are using He gas you want a turbo pump. Please clarify. Answer: The statement mentions "cryopump (when applicable)". The expectation and requirement is that a Turbo Pump will be used. If, however, a cryopump is justified then the software should be able to provide control over regeneration cycles. 7. Is it required to run 50 wafers in a row through the loadlock wafer handeling system and then run 50 depositions? Answer: Handling of 50 wafers through loadlock, pumpdown, dwell at temp (room temp is fine), vent, return to loadlock. 8. With regard to cross-wafer uniformity on 150mm substrate less than 5% as measured by a sheet resistance measurement. Does this mean +/-5% or +/- 2.5%? IS there any edge exclusion in this measurement? Answer: Edge exclusion would be 5-10 mm depending on clamping configuration for the wafer. The uniformity should be better than +/- 2.5%. 9. Regarding the configuration of the RF/DC switching, what is meant by "Minimum of one (1) Multi-Position DC or RF switch that can be connected from a power supply to any of the sputtering source permitting sequential operation of each cathode." Answer: Any single source should have the capability of being configured to operate via RF, DC, or Pulsed DC operation. Further, both dual and triple source operation is desired such that any combination of RF, DC, or Pulsed DC operation could be completed any of the 2 or 3 sources. Essentially, if the vendor chooses to a use a switch to control the operation of the RF and/or DC power to the cathodes, they should highlight the full range of capabilities. We are most interested in having single, dual, and triple source simultaneous operation using any combination of RF, DC, or Pulsed DC on the cathodes (e.g. all RF, 2 RF / 1 DC, all DC, etc.)
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/notices/f739e549c052e0b15c91c0883e003915)
- Place of Performance
- Address: ACC-APG - Adelphi ATTN: AMSRD-ACC, 2800 Powder Mill Road Adelphi MD
- Zip Code: 20783-1197
- Zip Code: 20783-1197
- Record
- SN02883785-W 20120916/120915000850-f739e549c052e0b15c91c0883e003915 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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