AWARD
66 -- RECOVERY - High Rate Silicon Dioxide Deep Reactive Ion Etcher System
- Notice Date
- 9/28/2010
- Notice Type
- Award Notice
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- SB1341-10-RQ-0289
- Point of Contact
- Todd D Hill, Phone: 301-975-8802, Marie A. Gilliam, Phone: 3019756753
- E-Mail Address
-
todd.hill@nist.gov, marie.gilliam@nist.gov
(todd.hill@nist.gov, marie.gilliam@nist.gov)
- Small Business Set-Aside
- N/A
- Award Number
- SB1341-10-SU-1031
- Award Date
- 9/23/2010
- Awardee
- Plasma-Therm LLC, 10050 16TH Street North, St. Petersburg, Florida 33716, United States
- Award Amount
- $540,500.00
- Line Number
- Line Items 0001 - 0007
- Description
- RECOVERY: THIS ACQUISITION IS BEING FUNDED BY THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) OF 2009. THIS NOTICE IS PROVIDED FOR INFORMATION PURPOSES ONLY. THIS AWARD NOTICE IS ISSUED IN ACCORDANCE WITH THE GUIDANCE FOR THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) 0F 2009. THE REQUIREMENT HAS BEEN AWARDED ON A COMPETITIVE BASIS, UNRESTRICTED, FOR A HIGH RATE SILICON DIOXIDE DEEP REACTIVE ION ETCHER SYSTEM. PURCHASE ORDER SB1341-10-SU-1031 WAS AWARDED TO PLASMA-THERM LLC., IN THE AMOUNT OF $540,500.00.
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/SB1341-10-RQ-0289/listing.html)
- Record
- SN02300002-W 20100930/100928235445-1cbe87734f29525b25fc0097ab78de2c (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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