Loren Data's SAM Daily™

fbodaily.com
Home Today's SAM Search Archives Numbered Notes CBD Archives Subscribe
FBO DAILY ISSUE OF MARCH 06, 2010 FBO #3024
SOURCES SOUGHT

66 -- RECOVERY: High Resolution field Emission Scanning Electron Microscope

Notice Date
3/4/2010
 
Notice Type
Sources Sought
 
NAICS
334516 — Analytical Laboratory Instrument Manufacturing
 
Contracting Office
Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
 
ZIP Code
20899-1640
 
Solicitation Number
AMD-10-SS42
 
Archive Date
4/3/2010
 
Point of Contact
Kim S Stavish, Phone: 301-975-2672, Patrick K Staines, Phone: (301)975-6335
 
E-Mail Address
kim.stavish@nist.gov, patrick.staines@nist.gov
(kim.stavish@nist.gov, patrick.staines@nist.gov)
 
Small Business Set-Aside
N/A
 
Description
RECOVERY - THIS IS NOT A REQUEST FOR QUOTATIONS; A FULLY DEVELOPED TECHNICAL AND PRICE QUOTATION IS NEITHER NECESSARY NOR DESIRED. INFORMATION RECEIVED WILL BE USED FOR MARKET RESEARCH PURPOSES ONLY. THIS CONTEMPLATED PROCUREMENT IS ANTICIPATED TO UTILIZE THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) OF 2009 FUNDING IF IT IS DETERMINED THAT RESPONSIBLE SOURCES CAN SATISFY THE REQUIREMENT. All responsible sources are encouraged to respond to this notice; however, sources that do not respond shall not be precluded from responding to any subsequent solicitation. The National Institute of Standards and Technology (NIST) seeks a High Resolution Field Emission Scanning Electron Microscope (FESEM) to provide fundamental multiscale morphological and physical information for tracking the degradation modes of polymeric and cementitious construction materials. Responses from responsible sources should clearly establish capability of providing a High Resolution Field Emission Scanning Electron Microscope (FESEM). After results of this market research are obtained and analyzed and specifications are developed for the High Resolution FESEM, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that result would be conducted as a small business set-aside. Requirements for the High Resolution Field Emission Scanning Electron Microscope (FESEM) are as follows: • Base instrument o Minimum resolution of 1.0 nm at 15 kV; 1.5 nm at 1 kV o Schottky field emission electron source -- Probe current: 1 pA to 200 nA o Beam flux with variability less than or equal to 1 % over 24 hours. o Lower and upper secondary election detector system o Secondary and back-scattered electron detectors with in-lens detection o Adjustable objective lens aperture o Automatic lens alignment o Beam deceleration technology o 5-axis motorized stage o Sample chamber to accommodate specimens of up to 200 mm in diameter, with travel at least to 140 x 80 mm in x and y directions, and up to 20 mm in z-direction. o Specimen transfer chamber • Capability for X-Ray Microanalysis and Imaging • At least 30 mm2 or larger detector crystal for high solid angle data capture, high count rate with low dead timeSimultaneous SEM image input channel collection with X-ray images • Image export of raw count data for X-ray images from X-ray mapping and data cube-generated X-ray images o MnKa resolution of 129 eV or better o User-selectable pulse processing o Automation of the SEM magnification, focus functions and able to read data from the SEM o Automation of the SEM 5-axis stage in the x,y,z, tilt and rotation o Energy Dispersive Spectroscopy software o External beam control with user-selectable image input, adjustment of image quality (brightness, contrast) • Capability for Computed Tomography o Flange to mount system to SEM chamber and adaptor to existing SEM stage must be provided o The stage of the system must be able to be removed using standard tools by the SEM operator to allow switching imaging modes o Micro-scanning system that includes a means of converting the SEM primary electron beam to X-rays, a sample rotation stage, translation to affect magnification • Capability for Detection of Cathodoluminescence o Fully integrated with the SEM, including digital beam control o SEM chamber-mounted detector with retractable and detachable mirror o Capability for live color imaging o Spectral response detection of at least 300 nm to 800 nm, or better o Compatible with X-ray microanalysis and imaging system regards SEM beam and stage control. • Milling /Polishing System o Variable Speed: 10- 600 rpm o Low speed, high torque rotation o Solid, cast aluminum construction • Plasma Etcher o Large chamber to accommodate specimens up to 7 in diameter and 3 in high o Compatible with argon, oxygen, CF4, and other gas mixtures o System standard with 3 ports to allow simultaneous cleaning o Optimizable power level for each specimen type and gas species o Vacuum pump with a corrosive series 2 stage rotary vane pump charged with inert vacuum fluid and safe for use with oxygen, resistant to corrosive gas species, and has low vapor pressure • Cryomicrotome o Eucentric movement of stereomicroscope o Contract free through-the-wall specimen arm for vibration free sectioning o Fully motorized knife stage - north-south and east-west motions o Low temperature section system - Temperatures -15 degrees to -185 degrees C o Liquid nitrogen dewar / pump o Individual temperatures for specimen, knife, and gas o Cryochamber mounting on chassis to prevent external vibrations to the knife o FC mount function and hot plug operation o Heated chamber walls to prevent ice condensation o Rotating knife holder accommodates 2 glass or diamond knives with individual knife angle setting • Vacuum Evaporator o Turbo-molecular high-vacuum pump system o Liquid nitrogen trap for improved vacuum o At least 30 cm x 30 cm bell jar to accommodate specimens o At least 2 kVA evaporation power supply, for two evaporation sources o Sputtering module capable of sputtering precious metals o Carbon rod and filament evaporation fixtures o Rotating / tilting specimen holder o Quartz crystal film thickness holder • Passive and active vibration isolation system that reduces ambient random and periodic noise to limits suitable for the microscope, and occupies a footprint no larger than the SEM plinth base and active AC field cancellation system. • Only new instruments will be considered. Requested Information to be Included in Responses to this Notice: 1. Indicate whether your company manufactures or is an authorized reseller/business partner for a HIGH RESOLUTION FESEM of any kind and, if so, please provide complete commercial specifications for the HIGH RESOLUTION FESEM that your company manufactures or sells, including the name of the company that manufactures the HIGH RESOLUTION FESEM, where it is manufactured, and detailed functional and performance specifications that the product meets. 2. If your organization is an original equipment manufacturer of HIGH RESOLUTION FESEMs, then please provide the name of company(ies) that are authorized by your organization, as the OEM, to sell your organization's HIGH RESOLUTION FESEM, as well as their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indicate the number of days, after acceptance of order, which is typical for delivery of HIGH RESOLUTION FESEM to the intended delivery location. 4. A complete copy of standard terms and conditions for the HIGH RESOLUTION FESEM that your organization manufactures or sells, to include, at a minimum: base warranty, available extended warranty (if offered), copy of software license(s) (if applicable), and customary payment terms. 5. Available training that can be purchased or may be included with the purchase of the HIGH RESOLUTION FESEM. 6. Customary documentation that is provided with the purchase of the HIGH RESOLUTION FESEM. 7. Describe optional items that are available for purchase for the HIGH RESOLUTION FESEM, such as consumables, spares, tools, additional components, ancillary equipment, software licenses, telephone support, etc. 8. If any of the above-referenced NIST HIGH RESOLUTION FESEM specifications appear to be unduly restrictive, then please indicate which specification you believe is unduly restrictive and indicate how you believe it could be more competitively worded such that it can be met by more than one HIGH RESOLUTION FESEM manufacturer and still meet the definition of commercial item at FAR 2.101. 9. Indicate whether modifications of the HIGH RESOLUTION FESEM currently manufactured or sold by your organization would be necessary to meet Government specifications listed in this notice and, if so, indicate whether those modifications would be considered minor modifications as described in the FAR Subpart 2.101 definition of commercial item. 10. The number of persons currently employed by your company, including parent organization and all subsidiaries (if applicable). 11. Indicate whether the HIGH RESOLUTION FESEM referenced in the response is currently available for ordering from one or more GSA Federal Supply Schedule (FSS) contracts and, if so, provide the GSA FSS contract number(s). 12. Provide any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Responses to this notice shall be sent by email to Kim Stavish, Contract Specialist, at kim.stavish@nist.gov, with cc: to Patrick Staines at Patrick.staines@nist.gov, so that it is received at that email address no later than March 19, 2010. The responses should include responses to all 12 requests for information listed above. Contracting Office Address: 100 Bureau Drive, Building 301, Room B125, Mail Stop 1640 Gaithersburg, Maryland 20899-1640 Primary Point of Contact: Kim Stavish Contract Specialist kim.stavish@nist.gov Phone: 301-975-2672 Secondary Point of Contact: Patrick Staines Contracting Officer Patrick.staines@nist.gov Phone: 301-975-6335
 
Web Link
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-10-SS42/listing.html)
 
Place of Performance
Address: TBD, United States
 
Record
SN02082653-W 20100306/100304234354-73c2c05bea88e03c3ba6391a4421f2d1 (fbodaily.com)
 
Source
FedBizOpps Link to This Notice
(may not be valid after Archive Date)

FSG Index  |  This Issue's Index  |  Today's FBO Daily Index Page |
ECGrid: EDI VAN Interconnect ECGridOS: EDI Web Services Interconnect API Government Data Publications CBDDisk Subscribers
 Privacy Policy  Jenny in Wanderland!  © 1994-2024, Loren Data Corp.