SOURCES SOUGHT
66 -- RECOVERY - MULTIPURPOSE LASER AND MICROSCOPY SYSTEM (ML&MS)
- Notice Date
- 12/28/2009
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-10-SS19
- Archive Date
- 2/2/2010
- Point of Contact
- Eduardo F. Baca, Phone: 3019756388, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
eduardo.baca@nist.gov, todd.hill@nist.gov
(eduardo.baca@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- RECOVERY - THIS IS NOT A REQUEST FOR QUOTATIONS; A FULLY DEVELOPED TECHNICAL AND PRICE QUOTATION IS NEITHER NECESSARY NOR DESIRED. INFORMATION RECEIVED WILL BE USED FOR MARKET RESEARCH PURPOSES ONLY. THIS CONTEMPLATED PROCUREMENT IS ANTICIPATED TO UTILIZE THE AMERICAN RECOVERY AND REINVESTMENT ACT (ARRA) OF 2009 FUNDING IF IT IS DETERMINED THAT RESPONSIBLE SOURCES CAN SATISFY THE REQUIREMENT. All responsible sources are encouraged to respond to this notice; however, sources that do not respond shall not be precluded from responding to any subsequent solicitation. The National Institute of Standards & Technology (NIST) has a need for a high performance Multipurpose Laser System and Microscopy System (ML&MS) to be used as part of NIST's research and measurements in a wide range of areas, including study of the structure and function of enzymes involved in alternative fuel production, study of fundamental interactions of ultrafast light pulses with matter, development of new quantum computing and atomic clock technologies. NIST is especially interested in responses from integrating vendors who can propose to provide the entire Multipurpose Laser and Microscopy System, including all components of all five major subsystems. The integrating vendor will be responsible for manufacturing or acquiring, assembling, testing, installing, and providing technical support after installation for the subsystems at NIST facilities in Boulder, Colorado. However, responses are also solicited from vendors who may be able to provide only parts of the entire Multipurpose System. All responses should clearly specify that the vendor is potentially interested in providing all parts of the Multipurpose System, or should clearly specify which parts of the Multipurpose System the vendor is interested in providing. Responses from responsible sources should clearly establish capability of providing Multipurpose Laser and Microscopy Sytems and components. After results of this market research are obtained and analyzed and specifications are developed for an ML&MS that can meet NIST's minimum requirements, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that result would be conducted as a small business set-aside. The ML&MS should have higher end functional capabilities envisioned in the minimal specifications outlined below for each of the major subsystems included in this equipment suite. Responses should establish that vendors are capable of meeting NIST requirements through their capabilities of manufacture, acquisition, and/or integration of equipment or equipment suites, installation, and support of the equipment. The ML&MS is comprised of five major subsystems as listed below. Only very general specifications for each of the five major subsystems are provided below. The full solicitation will contain detailed specifications for each of the major components. 1. Medium Repetition Rate Amplified Laser Subsystem • A mode-locked titanium-doped sapphire oscillator, regenerative amplifier, non-collinear optical parametric amplifier, and pulse compression optics to generate femtosecond-order laser pulses. • User-adjustable center wavelength tunable from 750 nanometers to 840 nanometers with sub-25 femtosecond pulse duration; minimum achievable pulse duration with external compression optics less than or equal to 10 femtoseconds; 10 kHz to 100 kHz adjustable repetition rate. 2. High Repetition Rate Amplified Laser Subsystem • One or more pump lasers, a mode-locked laser oscillator, regenerative amplifier, and optical parametric amplifier. • User-adjustable central wavelength of 770 nanometers, repetition rate variable from 10 kHz to a minimum of 290 kHz; Pulse Duration less than 150 femtoseconds. 3. Trapped Ion Laser and Analysis System The Trapped Ion Laser and Analysis System comprises seven components that are used to generate and analyze extremely well-controlled laser radiation at various wavelengths for research and measurements on quantum computing systems and atomic frequency standards using some of the technologies for quantum computing research. • Single frequency fiber laser operating at 1070 nanometers. • High power fiber laser source for generation of 626 nanometer and 313 nanometer radiation. • Narrow linewidth fiber laser source operating at 1118 nanometers. • Narrow linewidth fiber laser source operating at 1126 nanometers. • High accuracy, broad wavelength range laser spectrum analyzer. • 124 Gigahertz diode amplifier/multiplier chain. • Mode-locked pulsed titanium-doped sapphire laser system. 4. Atomic Force Microscope • Atomic Force Microscope with atomic-resolution capability with closed loop positional control in air and in fluid at room temperature. • Environmental isolation that provides for active temperature control of the AFM assembly and the sample to 0.1 °C. • The AFM must provide greater than or equal to 20 dB of acoustical isolation and include an isolation table that provides 6-axis active stabilization. • The AFM needs to be compatible with very small cantilevers, including a laser spot size of less than or equal to 3 micrometers by 9 micrometers. 5. Scanning Electron Microscope (SEM) and Electron Beam Lithography (EBL) • The SEM must be cable of imaging a continuously adjustable range of acceleration voltages between 200 volts and 30,000 volts; it must achieve a 1.0 nanometer resolution at 15,000 volts and 1.7 nanometer resolution at 1,000 volts; beam current at least 20 nanoamperes; must also include a method for rapidly blanking the electron beam from the sample with the following specifications; rise-fall time, less than 30 nanoseconds; On-off ratio: more than 10,000.. • The EBL system will include all hardware necessary to convert software patterns into control voltages for steering and blanking the electron beam. The pattern generation hardware must meet the following specifications, resolution 4000 x 4000 x 8 bits, minimum dwell time: 100 ns/pixel, maximum dwell time: 4 ms/pixel. Requested Information to be Included in Responses to this Notice: 1. Please indicate whether your company manufactures or is an authorized reseller/business partner for a ML&MS of any kind and, if so, please provide complete commercial specifications for the ML&MS that your company manufactures or sells, including the name of the company that manufactures, reconditions, or remanufactures the ML&MS, where it is manufactured, and detailed functional and performance specifications that the product meets. 2. If your organization is an original equipment manufacturer of ML&MS, then please provide the name of company(ies) that are authorized by your organization, as the OEM, to sell your organization's ML&MS, as well as their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Describe optional items that are available for purchase for the ML&MS, such as consumables, spares, tools, additional components, ancillary equipment, software licenses, telephone support, etc. 4. Indicate whether modifications of the ML&MS manufactured or sold by your organization would be necessary to meet Government specifications listed in this notice and, if so, indicate whether those modifications would be considered minor modifications as described in the FAR Subpart 2.101 definition of commercial item. 5. Provide any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Responses to this notice shall be sent by email to Eduardo F. Baca, Support Contractor, at eduardo.baca@nist.gov, with cc: to Todd Hill at todd.hill@nist.gov, so that it is received at that email address no later than the closing date. The responses should include responses to the 12 questions listed above. Contracting Office Address: 100 Bureau Drive, Gaithersburg, Maryland 20899-1640 Primary Point of Contact: Eduardo Baca Support Contractor Contract Specialist eduardo.baca@nist.gov Phone: 301-975-6388 Secondary Point of Contact: Todd Hill, Contracting Officer todd.hill@nist.gov Phone: 301-975-8802
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