Loren Data's SAM Daily™

fbodaily.com
Home Today's SAM Search Archives Numbered Notes CBD Archives Subscribe
FBO DAILY ISSUE OF DECEMBER 18, 2009 FBO #2946
SOURCES SOUGHT

66 -- RECOVERY - Master Reticle Pattern Generator

Notice Date
12/16/2009
 
Notice Type
Sources Sought
 
NAICS
334516 — Analytical Laboratory Instrument Manufacturing
 
Contracting Office
Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
 
ZIP Code
20899-1640
 
Solicitation Number
AMD-10-SS24
 
Archive Date
1/23/2010
 
Point of Contact
JoAnn Moore, Contractor, Phone: 3019758335, Todd D Hill, Phone: 301-975-8802
 
E-Mail Address
joann.moore@nist.gov, todd.hill@nist.gov
(joann.moore@nist.gov, todd.hill@nist.gov)
 
Small Business Set-Aside
N/A
 
Description
Title: RECOVERY: MASTER RETICLE PATTERN GENERATOR Description(s): The National Institute of Standards & Technology (NIST) seeks information on commercial vendors that are capable of providing a pattern generator for the fabrication of photomasks and to direct-write lithographic patterns onto various substrates. After results of this market research are obtained and analyzed and specifications are developed for a pattern generator system that can meet NIST's minimum requirements, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside. This contemplated procurement is anticipated to utilize American Reinvestment Recovery Act of 2009 Funds if it is determined that responsible sources can satisfy the requirement. THIS IS NOT A REQUEST FOR QUOTATION, INFORMATION RECEIVED WILL BE USED FOR MARKET RESEARCH PURPOSES ONLY. NIST has a need for a master reticle pattern generator that would meet the following requirements: 1. The pattern generator must have a resolution of better than 0.7 um with less than 30 nm pixel placement accuracy. The system must be able to write patterns at a rate of at least 10 mm x 10 mm per minute. The uniformity of the critical dimensions must be at most 100 nm (3 sigma). The pattern generator must be able to accept substrates ranging from a 76.2 mm wafer to a 200 mm x 200 mm plate. 2. The Master Reticle Pattern Generator must be in a climate-controlled environmental chamber capable of maintaining the system in the condition needed for optimal performance. The system must operate at an altitude of 1600 meters above sea level. It is highly desirable to have an option for the automatic loading and unloading of substrates for serial automatic photomask generation. 3. The master reticle pattern generator must accept pattern data in CIF or GDSII formats or have software to convert from these formats into the internal format of the system. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company's size classification in any response to this notice. Companies that manufacture pattern generators for photomasks are requested to email a detailed report describing their abilities to joann.moore@nist.gov cc'd: todd.hill@nist.gov no later than the response date for this sources sought notice. The report should include achievable specifications and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice: 1. Name of the company that manufactures the system components for which specifications are provided. 2. Name of company(ies) that are authorized to sell the system components, their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indication of number of days, after receipt of order that is typical for delivery of such systems. 4. Indication of whether each instrument for which specifications are sent to todd.hill@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s). 5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Primary Point of Contact: JoAnn Moore Senior Acquisition Specalist 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640 Gaithersburg, Maryland 20899-1640 Place of Contract Performance: NIST Gaithersburg, Maryland 20899 United States Secondary Point of Contact: Todd D Hill Contracting Office Address: 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640 Gaithersburg, Maryland 20899-1640 Place of Contract Performance: NIST Gaithersburg, Maryland 20899 United States
 
Web Link
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-10-SS24/listing.html)
 
Place of Performance
Address: NIST, Boulder, Colorado, United States
 
Record
SN02025947-W 20091218/091217000656-eb4b0f22c99d12ec6db1968a6c553065 (fbodaily.com)
 
Source
FedBizOpps Link to This Notice
(may not be valid after Archive Date)

FSG Index  |  This Issue's Index  |  Today's FBO Daily Index Page |
ECGrid: EDI VAN Interconnect ECGridOS: EDI Web Services Interconnect API Government Data Publications CBDDisk Subscribers
 Privacy Policy  Jenny in Wanderland!  © 1994-2024, Loren Data Corp.