SOURCES SOUGHT
66 -- RECOVERY - Master Reticle Pattern Generator
- Notice Date
- 12/16/2009
- Notice Type
- Sources Sought
- NAICS
- 334516
— Analytical Laboratory Instrument Manufacturing
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition Management Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640, Gaithersburg, Maryland, 20899-1640
- ZIP Code
- 20899-1640
- Solicitation Number
- AMD-10-SS24
- Archive Date
- 1/23/2010
- Point of Contact
- JoAnn Moore, Contractor, Phone: 3019758335, Todd D Hill, Phone: 301-975-8802
- E-Mail Address
-
joann.moore@nist.gov, todd.hill@nist.gov
(joann.moore@nist.gov, todd.hill@nist.gov)
- Small Business Set-Aside
- N/A
- Description
- Title: RECOVERY: MASTER RETICLE PATTERN GENERATOR Description(s): The National Institute of Standards & Technology (NIST) seeks information on commercial vendors that are capable of providing a pattern generator for the fabrication of photomasks and to direct-write lithographic patterns onto various substrates. After results of this market research are obtained and analyzed and specifications are developed for a pattern generator system that can meet NIST's minimum requirements, NIST may conduct a competitive procurement and subsequently award a Purchase Order. If at least two qualified small businesses are identified during this market research stage, then any competitive procurement that resulted would be conducted as a small business set-aside. This contemplated procurement is anticipated to utilize American Reinvestment Recovery Act of 2009 Funds if it is determined that responsible sources can satisfy the requirement. THIS IS NOT A REQUEST FOR QUOTATION, INFORMATION RECEIVED WILL BE USED FOR MARKET RESEARCH PURPOSES ONLY. NIST has a need for a master reticle pattern generator that would meet the following requirements: 1. The pattern generator must have a resolution of better than 0.7 um with less than 30 nm pixel placement accuracy. The system must be able to write patterns at a rate of at least 10 mm x 10 mm per minute. The uniformity of the critical dimensions must be at most 100 nm (3 sigma). The pattern generator must be able to accept substrates ranging from a 76.2 mm wafer to a 200 mm x 200 mm plate. 2. The Master Reticle Pattern Generator must be in a climate-controlled environmental chamber capable of maintaining the system in the condition needed for optimal performance. The system must operate at an altitude of 1600 meters above sea level. It is highly desirable to have an option for the automatic loading and unloading of substrates for serial automatic photomask generation. 3. The master reticle pattern generator must accept pattern data in CIF or GDSII formats or have software to convert from these formats into the internal format of the system. NIST is seeking responses from all responsible sources, including large, foreign, and small businesses. Small businesses are defined under the associated NAICS code for this effort, 334516, as those domestic sources having 500 employees or less. Please include your company's size classification in any response to this notice. Companies that manufacture pattern generators for photomasks are requested to email a detailed report describing their abilities to joann.moore@nist.gov cc'd: todd.hill@nist.gov no later than the response date for this sources sought notice. The report should include achievable specifications and any other information relevant to your product or capabilities. Also, the following information is requested to be provided as part of the response to this sources sought notice: 1. Name of the company that manufactures the system components for which specifications are provided. 2. Name of company(ies) that are authorized to sell the system components, their addresses, and a point of contact for the company (name, phone number, fax number and email address). 3. Indication of number of days, after receipt of order that is typical for delivery of such systems. 4. Indication of whether each instrument for which specifications are sent to todd.hill@nist.gov are currently on one or more GSA Federal Supply Schedule contracts and, if so, the GSA FSS contract number(s). 5. Any other relevant information that is not listed above which the Government should consider in developing its minimum specifications and finalizing its market research. Primary Point of Contact: JoAnn Moore Senior Acquisition Specalist 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640 Gaithersburg, Maryland 20899-1640 Place of Contract Performance: NIST Gaithersburg, Maryland 20899 United States Secondary Point of Contact: Todd D Hill Contracting Office Address: 100 Bureau Drive, Building 301, Room B129, Mail Stop 1640 Gaithersburg, Maryland 20899-1640 Place of Contract Performance: NIST Gaithersburg, Maryland 20899 United States
- Web Link
-
FBO.gov Permalink
(https://www.fbo.gov/spg/DOC/NIST/AcAsD/AMD-10-SS24/listing.html)
- Place of Performance
- Address: NIST, Boulder, Colorado, United States
- Record
- SN02025947-W 20091218/091217000656-eb4b0f22c99d12ec6db1968a6c553065 (fbodaily.com)
- Source
-
FedBizOpps Link to This Notice
(may not be valid after Archive Date)
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