SOURCES SOUGHT
66 -- Electron Beam Lithography System
- Notice Date
- 6/1/2007
- Notice Type
- Sources Sought
- NAICS
- 339111
— Laboratory Apparatus and Furniture Manufacturing
- Contracting Office
- Department of Energy, Brookhaven National Laboratory (DOE Contractor), Brookhaven, PO Box 5000 Bldg. No. 355, Upton, NY, 11973, UNITED STATES
- ZIP Code
- 00000
- Solicitation Number
- EBL121935
- Response Due
- 6/15/2007
- Archive Date
- 6/30/2007
- Description
- Brookhaven National Laboratory, operated by Brookhaven Science Associates, under Prime Contract No. DE-AC02-98CH10886, with the U.S. Department of Energy, plans to acquire an Electron Beam Lithography (EBL) system instrument for the Nanopatterning Laboratory of the Center for Functional Nanomaterials. The EBL must use a ZrO/W Schottky field emission source and a column capable of focusing an electron beam with an accelerating voltage of 30 to 50 keV to a nanoscale diameter probe. The probe will be scanned to expose e-beam sensitive resists or produce images using a secondary electron detector. The EBL must be capable of generating lines in PMMA or equivalent resists with a width < 20 nm over areas that may be as large as 1 by 1 mm on silicon wafers up to 100 mm in diameter. A stage controlled by a laser interferometer must be available be to stitch individually patterned fields together with an accuracy < 40 nm. Complete specifications and the complete request for proposal may be downloaded from this website. This, acquisition, is a, ?Best Value?, procurement. The utilization of this procedure is expected to provide the greatest overall benefit to BSA/BNL. ?Best Value? employs a trade off process that permits award to other than the lowest priced offeror or to the highest technically rated offeror. The tradeoff process, associated with Best Value involves a comparative weighing of the evaluation factors and sub-factors identified in the Request for Proposals (RFP). Specifically, the trade off process involves selecting the most advantageous offer based upon an integrated assessment of both non-cost/price factors, taken in their assigned relative importance. The following factors, in their relative order of weighting, will be utilized to evaluate the offers EBL Technical Specification 1. General Summary Production and Installation Schedule. 2; Equipment Criteria a. Electron Optics and Beam Deflection b. Chamber and Specimen Stage c. Vacuum System d. Pattern Generation e. System Software f. Imaging 3. Process Criteria 3.1 Process performance and samples 3.1.1 Electron Beam Lithography: linear grating fabrication and stitching. 3.1.2 Electron Beam Lithography: Circular grating fabrication and stitching. 3.1.3 Electron Beam Imaging: 4. System Support EBL a. Operating Manuals b. Warranty c. Training d. Service Coverage 5. Performance Risk EBL production and installations a Relevant Experience b. Quality of Work c. Timeliness of Performance Proposals are due June 15, 2007 by 4:00 PM, EDT, and shall be submitted to Brookhaven Science Associates, Brookhaven National Laboratory, Attention: D. Paveglio, Bldg. 830M, Upton, NY 11973. This RFP has been sent to the following known vendors: Raith USA, Inc. STS-Elionix Mantis Deposition Ltd
- Place of Performance
- Address: Brookhaven National Laboratory, Upton, NY
- Zip Code: 11973
- Country: UNITED STATES
- Zip Code: 11973
- Record
- SN01308289-W 20070603/070604102835 (fbodaily.com)
- Source
-
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