SOURCES SOUGHT
66 -- Advanced Spin Coating System
- Notice Date
- 8/11/2006
- Notice Type
- Sources Sought
- NAICS
- 339111
— Laboratory Apparatus and Furniture Manufacturing
- Contracting Office
- Department of Energy, Brookhaven National Laboratory (DOE Contractor), Brookhaven, PO Box 5000 Bldg. No. 355, Upton, NY, 11973
- ZIP Code
- 11973
- Solicitation Number
- ASC107109
- Response Due
- 9/1/2006
- Archive Date
- 9/16/2006
- Description
- Brookhaven Science Associates plans to acquire an advanced spin coating tool for the Nanopatterning Laboratory of the Center for Functional Nanomaterials at BNL. The primary function of the spin coating tool is to apply a layer of photoresist, with a specified thickness determined by the spin speed, to silicon wafers or other substrates with similar dimensions that will then be exposed in optical or e-beam lithography exposure equipment. De-mountable chucks must be provided for wafers up to 200 mm in diameter as well for as irregular-shaped pieces that are less than 1 cm in extent. Special chucks for mounting fragile samples such as gallium arsenide shall be listed as options. The advanced spin coater should be a free-standing unit with sufficient storage capability for resists with an attached hotplate for baking the resist. The spin coater should be able to vary the thickness of the applied resist may range from a few nanometers to several hundred microns depending on the type of resist and its viscosity. The spin coater must be compatible with positive and negative resists commonly used in for optical and e-beam application. Shipley 1811, AZ 4110, AZ 4620, PMMA, ZEP 520A, HSQ and SU-8 are examples of the resists that will be used with this equipment. Equipment Criteria: Vendors must supply detailed descriptions and dimensioned layout drawings of the deep reactive ion etcher, the materials used in its construction, failure rate data and, where applicable, manufacturer?s specifications of subsystems such as vacuum pumps, mass flow controllers, and RF generators. The vendors proposed system will be evaluated for operational reliability, quality of construction, and cost. Process Criteria: For each process, vendors must describe how their process or approaches, meets, or exceeds the listed criteria. Vendors must provide a reasonable amount of detail concerning etching chemistry, power level, and material removal rates. BNL will submit its samples to the vendor?s application laboratory and evaluate the results with its own equipment Proposals are due September 1, 2006, by 4:00 PM, EDT, and shall be submitted to Brookhaven Science Associates, Brookhaven National Laboratory, Attention: D. Paveglio, Bldg. 355, Upton, NY 11973, by US mail This RFP has been sent to the following known manufacturers: EV Group, Inc, 300 University Dr, Suite 100, Phoenix, AZ, 85034 Suss Micro Tec, 228 Suss Drive, Waterbury Center, VT 05677 All other interested vendors may down load Request for Proposal ASC107109 from this website or contact David J. Paveglio.
- Place of Performance
- Address: Brookhaven National Laboratory, Upton, NY
- Zip Code: 11973
- Country: UNITED STATES
- Zip Code: 11973
- Record
- SN01112543-W 20060813/060811220519 (fbodaily.com)
- Source
-
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