MODIFICATION
66 -- OPTICAL PROFILOMETER SYSTEM
- Notice Date
- 6/9/2006
- Notice Type
- Modification
- NAICS
- 333314
— Optical Instrument and Lens Manufacturing
- Contracting Office
- Department of the Navy, Office of Naval Research, Naval Research Laboratory, 4555 Overlook Ave. S.W., Washington, DC, 20375
- ZIP Code
- 20375
- Solicitation Number
- N00173-06-R-KK03
- Response Due
- 6/12/2006
- Archive Date
- 6/27/2006
- Small Business Set-Aside
- Total Small Business
- Description
- The purpose of this amendment is to answer questions from a potential offeror. The questions and answers are as follows: 1. Regarding the tilt platform, Specifications1.0(d) and 6.0(b), while a platform is desirable, it is not fully understood why a tilt platform is required. Can you elaborate? A tilt platform is necessary to level a sample before profilometry. NRL often processes samples of non-uniform thickness, whose base and front surface are therefore not parallel. A tilt stage is needed to compensate for variations in height due to non-uniform thickness. 2. Specification 6.0 (e) indicates that the controller software must include stitching. This statement is not clear. The Chromatic Aberration (CA) technology allows for complete area profiles without joining images(stitching). The stitching requirement is understood when the interferometric principle is used. Please clarify. By stitching, NRL refers to how CA can obtain area profiles. Area profiles are obtained by joining (stitching together) line scans taken by stepping at intervals along the y axis. Stitching is intended to identify how area scans are to be made from CA line scan joining.
- Place of Performance
- Address: Contractor's facility
- Record
- SN01067091-W 20060611/060609221147 (fbodaily.com)
- Source
-
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