SPECIAL NOTICE
66 -- AML Scanning Electron Beam Research Metrology Platform
- Notice Date
- 4/23/2003
- Notice Type
- Special Notice
- Contracting Office
- Department of Commerce, National Institute of Standards and Technology (NIST), Acquisition and Logistics Division, 100 Bureau Drive, Building 301, Room B129, Mail Stop 3571, Gaithersburg, MD, 20899-3571
- ZIP Code
- 20899-3571
- Archive Date
- 6/4/2003
- Description
- THIS NOTICE IS A REQUEST FOR INFORMATION TO OBTAIN INFORMATION FOR MARKET RESEARCH PURPOSES. THIS NOTICE IS NOT A REQUEST FOR COMPETITIVE PROPOSALS. ***The National Institute of Standards & Technology, (NIST), is soliciting information for a scanning electron beam research and metrology platform for the new Advanced Metrology Laboratory (AML) currently being constructed. This will be a very specialized instrument. Currently, there is no known commercial instrument that can meet all of NIST's requirements.***The fundamental requirements for this instrument are outlined in this request for information, and manufacturers are invited to provide information relating to their current and future instrumentation relative to these specifications. Final specifications will be determined based on information gathered through this inquiry.***Equipment Name: AML Scanning Electron Beam Research and Metrology Platform; Requesting Office: NIST/ Manufacturing Engineering Laboratory/Precision Engineering Division; Project/Program: Scanning Electron Microscope-based Metrology/Nanometer Scale; Dimensional Metrology.***DESCRIPTION: The AML Scanning Electron Beam Research and Metrology Platform (SEBMP) is a unique reference measurement instrument. This instrument incorporates advanced laser interferometry in the specimen stage to accurately track the X and Y motion of the stage. This instrument will be used for the development and calibration of accurate length metrology reference artifacts and to provide dimensional metrology solutions on samples that can be measured by an electron beam as the probe.***PROGRAMATIC RATIONALE: Scanning Electron Microscopes (SEM) are widely used in U. S. research, development and manufacturing, especially in the fields of nanotechnology and microelectronics where individual device sizes are now approaching few tens of nanometers, but overall sample size is 300 mm or greater. A modern scanning electron beam research and metrology platform is needed for the AML in order to satisfy the NIST customers' needs for length standards on large substrates (silicon wafers and photomasks) and to initiate breakthroughs in accurate metrology using scanned electron beam instrumentation.***Currently, the NIST SEM metrology instrumentation is severely limited by overall specimen dimension. Because of this limitation, larger samples like semiconductor production wafers, 2-dimensional grids and photomasks cannot be measured even if the existing, better than industrial metrology capability would allow the needed measurements. Many NIST customers, therefore, cannot be properly served without damaging or compromising the sample (specimen breakage, sawing or drop-in wafers).***Designed and developed properly, this SEBRMP is more than just an inspection instrument or a metrology tool. This instrument will be a unique instrument, which will enable vast improvement in measurement accuracy and precision on a variety of samples including defects and particles in the nanometer size range.***The Scanning Electron Beam Research and Metrology Platform is an indispensable research instrument, appropriate for the AML. This instrument will be a platform capable of ultra-high resolution imaging, characterization, and dimensional metrology of structures down to a few nanometers. The instrument will be capable of investigating samples as large as whole silicon wafers or phase-shifting photomasks and as small as the samples of nanotechnology research and development (standard stub size). This instrument will be unique in the world and will become a length reference measurement instrument for a whole host of artifacts. Capabilities are planned to include operation at various specimen chamber vacuum levels and “environmental” modes, a wide range of accelerating voltages (electron energies), landing energies and electron energy filtering with magnifications up to 500,000 times and spatial resolution down to 2 nm or better. The instrument will utilize NIST expertise in the development of interferometry for quick nanometer-level and slower picometer-level positioning and measurement accuracy. NIST is and has been developing laser control and data acquisition software for the current KLA/AMRAY SEM Metrology Instrument and that software is available for incorporation into the new instrument. This instrument will employ and exploit the contrast mechanisms advantageous or existing only for nanometer-sized structures. Three-dimensional imaging and metrology will be possible with extensive image processing and analysis, which allows the full use of information generated. It also will have a capability to form, modify and measure in-situ structures a few tens of nanometers in size with the electron beam. It will serve as the platform for accurate dimensional measurements of semiconductor wafers with nanometer structures, and it will be the practical complement to the theoretical modeling work of 2- and 3-dimensional metrology of nano-structures and devices. This instrument will be one of the most important tools used in nanotechnology that advances the measurement science, development, and theoretical modeling of nano-structured materials and devices. ***MINIMUM GENERAL SPECIFICATIONS: ***ELECTRON SOURCE: Field emission gun (thermally assisted FE or cold FE); ***ACCELERATING VOLTAGE RANGE: 100 V to at least 10 kV (30 kV preferred); BEST ACHIEVABLE RESOLUTION: Minimum 2 nm or better (at most advantageous accelerating voltage) ; LOW kV resolution at 500V: 10 nm or better ; DIGITAL IMAGING CAPABILITY: Up to a minimum of 4096 x 4096 pixel resolution (or better) with minimum 16 bit gray scale resolution; BEAM STEERING: plus or minus 20 micrometer beam shift (@10 mm working distance); VARIOUS SCANNING SPEEDS: From slow to high speed, i.e. 80 sec/frame to TV rate; SPOT MODE: Stationary beam or spot mode capability for laser interferometric measurements. No deflection or drift of the electron beam while it is stationary; DIGITAL IMAGE CAPTURING: Single frame, running average and sum of 2 to 1024 images; MINIMUM. MAGNIFICATION: 100 x or lower; MAXIMUM MAGNIFICATION: 500 000 x or higher; ACOUSTIC NOISE: Less than 65 decibels; VIBRATION: 1-10 Hz 2 micrometers peak to peak; STRAY FIELDS Horizontal, 150 micro-Tesla; VERTICAL 100 micro-Tesla; DETECTED SIGNALS: Standard mode; SECONDARY ELECTRONS - High efficiency: In-lens Everhart-Thornley type or better with symmetric collection: Energy filtered in chamber side Everhart-Thornley type or better; BACKSCATTERED ELECTRONS - High efficiency: Microchannel-plate, Filtered Everhart/Thornley, Robinson ,Dual low-loss (energy filtered); ENVIRONMENTAL/HIGH PRESSURE MODE: Electron detection, ion detection or photon detection; SAMPLE SIZES: 10 mm sample stub to 300 mm wafer (maximum full viewable sample region), Photomask capability (up to 230 mm (9 inches)); TILTED IMAGING CAPABILITY: Stage tilt of 0 to 45 degrees and/or beam tilt of 0 to 15 degrees; STAGE/SAMPLE BIASING: Grounded and/or biased at least to 3 kV; SAMPLE TRANSFER: User-friendly manual transfer required however automated transfer preferred; CHARGE SUPPRESSION: High-pressure/'environmental' mode with function up to at least 160 Pa (1.2 torr); SAMPLE STAGE CHAMBER: Should accommodate the laser interferometry; STAGE: Dual use/mode stage. Standard function motorized stage with micro-stepping precision with computer positioning and computer-driven laser interferometry metrology stage with programmable sample locations and positions. In laser metrology mode the electron beam will be held stationary and the stage will be fully controlled and tracked by laser interferometry in X and Y. A single integrated specimen motion stage can be provided or individual standard stage and a separate laser interferometer stage can be supplied. If the latter is supplied a mechanism to protect and maintain the additional stage under vacuum is to be supplied; VACUUM SYSTEM: Oil-free ultra-clean high-vacuum system, High-pressure/ environmental vacuum capability fully computer controlled, Variable Pressure capability/operation, Variable Residual gas composition; ON-SITE SERVICE CONTRACT: Full on-site service contract with full system responsibility for 5 years to be included in the purchase price; FAULT PROTECTION: Full interlock protection against vacuum problems, like air brake-ins, power failure, and cooling water interruption; LASER INTERFEROMETER STAGE: Laser interferometer stage control and data collection is to be available throughout the entire stage motion. The interferometry is to be fully software controlled. Data acquisition will be in a stationary beam mode (non scanning) with the stage motion being monitored with a least count resolution of the interferometry of 1 nm or better. NIST is and has been developing laser control and data acquisition software for the current AMRAY SEM Metrology Instrument and that software is available for incorporation into the new instrument; OTHER FUNCTIONS: Standard laboratory SEM instrument functions. ACCESSORIES: Additional possible accessories and/or functions should be identified. *** INFORMATION TO BE SUBMITTED: Responses to this notice should address each of the specifications listed herein, include the best quality images including binary or phase shifting photomask samples in both printed and digital format of both standard high vacuum operational mode and high pressure SEM mode, and answer all of the following questions. Photomask samples can be obtained upon submission of a written request, via fax or e-mail to Carol A. Wood, Contract Specialist. QUESTIONS****Are any current instruments fully capable of meeting this specification?***What current instrumentation or components of current commercial instrumentation meets the requirement or part of the requirement?****What new component(s) need to be developed and when can they be made available?****Would you work with a third party to develop the needed component(s) and who would they be?****What combination of features can meet the specification and requirements?**** What portions of the specifications cannot be met and why?****If only a set of the requirements can be met by current instrumentation a detailed explanation of (1) what extent the specification can be met, (2) what would be required to meet the remaining specifications and (3) If portions of the specifications cannot be met, why?****Contractor's Business Classification (small business, small disadvantaged business, large business, etc.) based on a small business size standard of 500 employees.****Estimated price and delivery. ****Responses shall be submitted to the National Institute of Standards and Technology, ATTN: Carol A. Wood, Contract Specialist, 100 Bureau Drive, Mail Stop 3571, Gaithersburg, MD 20899 not later than May 20, 2003 at 3:00 PM Eastern Standard Time. Fax & e-mail responses will be accepted, however, must be complete and include all required information. All questions shall be referred to the Contract Specialist.
- Web Link
-
Link to FedBizOpps document.
(http://www.eps.gov/spg/DOC/NIST/AcAsD/Reference-Number-03-AML-RFI/listing.html)
- Record
- SN00310770-F 20030425/030424065156 (fbodaily.com)
- Source
-
FedBizOpps.gov Link to This Notice
(may not be valid after Archive Date)
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